INDEOtec – Octopus
The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition…
The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition mode in one system without any interruption of the process sequence, provide an extraordinary high flexibility for many thin film applications.
