INDEOtec – Octopus
The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition mode in one system without any interruption of the process sequence, provide an extraordinary high flexibility for many thin film applications.
OCTOPUS II – PECVD/PVD system can cover a broad range of deposition job constellations, up to 6 deposition modules
Key Features
The Mirror reactor system (Mirror TOP for topside deposition / Mirror BOTTOMÂ for bottom-side deposition) can deposit two sides without flipping of substrates and without vacuum-breaking.
Technical Specification
Continuous and high-throughput deposition under vacuum.
Contact Us
| Shanghai Office | |
|---|---|
| Room Unit 605-607, Build 2, Xinglian Building, No.1535 Hongmei Road, Xuhui District, Shanghai | TEL: 021-5383 8811 FAX: 021-3367 8466 |
Key Industries
- Semiconductor, Solar & Electronics
INDEOtec is a Swiss privately held company driven by innovation and technology in thin film deposition equipment sectors. Company is…
