Scia Systems – Ion Beam Deposition Systems – scia Coat 200 & scia Coat 500
The scia Coat 200 is designed for homogeneous coating of 200 mm substrates, such as wafers. Typical applications of the system are multilayer films for magnetic sensors or optical coatings.
The scia Coat 500 is designed for homogeneous coating of high precision optics. Typical applications of the system are multilayer films for X-ray mirrors and filter coatings.
Available Models
Technical Specifications
| Substrate diameter | Up to 200 mm diameter; Carrier handling for multiple substrate sizes available |
| Substrate holder | Water cooled, Helium backside cooling contact; Substrate rotation 5 to 20 rpm; Tiltable in‑situ from 0° to 170° in 0.1° steps |
|---|---|
| Ion beam sources | Sputter source: RF120‑e |
| Assist source: RF120‑e or RF350‑e | |
| Neutralizer | Plasma bridge neutralizer: |
| Filament driven N‑DC or RF driven N‑RF | |
| Target holder | Target drum with 4 targets (tiltable), |
| each with max. 300 mm dia. | |
| Typical deposition rates | Al: 10 nm/min; Al2O3: 15 nm/min |
| Uniformity variation | ≤ 1.5 % |
| Base pressure | ≤ 5 x 10-7 mbar |
| System dimensions (W x D x H) | 2.70 m x 1.70 m x 2.40 m |
| (without electrical rack and pumps) |
The scia Coat 200 is designed for homogeneous coating of 200 mm substrates, such as wafers. Typical applications of the system are multilayer films for magnetic sensors or optical coatings.
The scia Coat 200 applies a beam from a focused broad beam ion source onto a sputter target. The beam of the assist ion source is directed to the substrate. By ion bombardment it is possible to control film characteristics or pre-clean the substrate.
If the system is equipped with a RF350‑e ion beam source as assist source, ion beam milling processes are also available on the same tool.
Technical Specifications
| Substrate diameter | Up to 200 mm with load-lock |
| 500 mm x 300 mm with manual loading | |
| Ion Beam Source | Rectangular microwave ECR-source LIN380‑e |
| Neutralizer | Plasma bridge neutralizer N‑DC |
| Target Holder | Target drum with 6 targets (tiltable), each with max. 400 mm x 200 mm |
| Typical deposition rate | Si: 10 nm/min |
| Axes performance | Linear from 0.01 mm/min up to 15 mm/min; Rotation up to 300 rpm |
| Uniformity deviation | ≤ 0.5 % over 200 mm dia. |
| ≤ 2 % over 500 mm x 300 mm | |
| Base pressure | ≤ 5 x 10-8 mbar |
| System dimensions (W x D x H) | 3.30 m x 1.70 m x 2.10 m |
| (without electrical rack, pumps and load-lock) | |
| Tool configurations | 1 process chamber, 1 load-lock optional |
| Software interfaces | SECS II / GEM, OPC on request |
The scia Coat 500 is designed for homogeneous coating of high precision optics. Typical applications of the system are multilayer films for X-ray mirrors and filter coatings.
The scia Coat 500 applies a beam from a linear ion beam source onto a rectangular sputter target. This linear geometry provides a good homogeneity of the deposited film in one dimension. Meanwhile, the sample is moved on a linear axis in a direction perpendicular to the beam’s profile, thereby contributing to homogeneity or defined gradients of the coating in the second dimension.
In addition the sample stage is equipped with a spin rotation and a changeable shaper system (up to 4 shapers) in front of the sample stage.
Key Industries
- Semiconductor, Solar & Electronics
Manufacturer of advanced ion beam and plasma processing systems, scia Systems established itself in a very short time on the…
